OKADA Tatsuya

写真a

Title

Assistant Professor

Researcher Number(JSPS Kakenhi)

30570618
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Current Affiliation Organization 【 display / non-display 】

  • Duty   University of the Ryukyus   Faculty of Engineering   School of Engineering_Electronic and Communication Engineering Program   Assistant Professor  

  • Concurrently   University of the Ryukyus   Graduate School of Engineering and Science   Electronic Systems and Devices   Assistant Professor  

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Academic degree 【 display / non-display 】

  • Hiroshima University -  Doctor of Philosophy (Engineering)

  • Hiroshima University -  Master of Engineering

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External Career 【 display / non-display 】

  • 2009.04
    　
    　

    University of the Ryukyus, Faculty of Engineering, Electrical and Electronics Engineering, Electronics and Electronic Materials,  

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Affiliated academic organizations 【 display / non-display 】

  • 2005.01
    -
    Now
     

    The Japan Society of Applied Physics 

  • 2009.11
    -
    Now
     

    The Institute of Electronics, Information and Communication Engieers 

  • 2012.09
    -
    Now
     

    The Society for Information Display 

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Research Interests 【 display / non-display 】

  • Thin Film Semiconductor,Rapid Thermal Annealing

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Research Areas 【 display / non-display 】

  • Nanotechnology/Materials / Thin film/surface and interfacial physical properties

  • Manufacturing Technology (Mechanical Engineering, Electrical and Electronic Engineering, Chemical Engineering) / Electron device and electronic equipment

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Published Papers 【 display / non-display 】

  • Crystallization of a-Si films deposited by RF sputtering using blue direct diode laser

    M. Hishida, N. Kobata, K. Miyano, M. Nobuoka, T. Okada, and T. Noguchi

    Photonics West     2023.01 [ Peer Review Accepted ]

    Type of publication: Research paper (international conference proceedings)

  • High mobility of (111)-oriented large-domain (>100 μm) poly-InSb on glass by rapid-thermal crystallization of sputter-deposited films

    T. Kajiwara, O. Shimoda, T. Okada, C. J. Koswaththage, T. Noguchi, and T. Sadoh

    Journal of Applied Physics   132 ( 14 ) 145302-1 - 145302-6   2022.10 [ Peer Review Accepted ]

    Type of publication: Research paper (scientific journal)

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      DOI

  • Formation of High-Mobility InSb Films on Glass by Sputtering and Rapid-Thermal Annealing

    T. Kajiwara, O. Shimoda, T. Okada, C. J. Koswaththage, T. Noguchi, and T. Sadoh

    International Conference on Solid State Devices and Materials     2022.09 [ Peer Review Accepted ]

    Type of publication: Research paper (international conference proceedings)

  • Crystallization of SiN Capped InSb Films on Glass by Rapid Thermal Annealing

    O. Shimoda, Y. Sawama, C. J. Koswaththage, T. Noguchi, T. Kajiwara, T. Sadoh, and T. Okada

    The 21st International Meeting on Information Display     396 - 396   2021.08 [ Peer Review Accepted ]

    Type of publication: Research paper (international conference proceedings)

  • Issues and the Improvement to the Crystallization of a-Si Films for LTPS TFTs on Arbitrary Panels

    T. Noguchi, and T. Okada

    The 20th International Meeting on Information Display     120 - 120   2020.08 [ Peer Review Accepted ]

    Type of publication: Research paper (international conference proceedings)

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Presentations 【 display / non-display 】

  • Crystallization of SiN Capped InSb Films on Glass by Rapid Thermal Annealing

    O. Shimoda, Y. Sawama, C. J. Koswaththage, T. Noguchi, T. Kajiwara, T. Sadoh, and T. Okada

    The 21st International Meeting on Information Display (COEX, Seoul, Korea (ON/OFF-LINE Hybrid Event), August 25-27, 2021) p.396 [P5-40].  2021.08  -  2021.08 

  • Issues and the Improvement to the Crystallization of a-Si Films for LTPS TFTs on Arbitrary Panels

    T. Noguchi, and T. Okada

    The 20th International Meeting on Information Display (Online Conference, August 25-28, 2020) p.120 [05_1583].  2020.08  -  2020.08 

  • Study of Leakage Current for Poly-Silicon Thin-Film Transistors with Metal-Source/Drain contact by BLDA

    K. Lee, K. Shimai, W. Choi, T. Okada, and T. Noguchi

    The 19th International Meeting on Information Display (HICO, Gyeongju, Korea, August 27-30, 2019) p.342 [P02-57].  (HICO, Gyeongju, Korea)  2019.08  -  2019.08 

  • Effect of 4% H2 Annealing to Poly-Si TFTs on Polyimide

    D. Tokieda, Y. Ishiki, T. Okada, T. Noguchi, and T. Okuyama

    The 19th International Meeting on Information Display (HICO, Gyeongju, Korea, August 27-30, 2019) p.327 [P02-42].  (HICO, Gyeongju, Korea)  2019.08  -  2019.08 

  • Attractive Crystallization of Semiconductor Films

    T. Noguchi, T. Okada, and C. J. Koswaththage

    The 19th International Meeting on Information Display (HICO, Gyeongju, Korea, August 27-30, 2019) p.226 [B20-3].  (HICO, Gyeongju, Korea)  2019.08  -  2019.08 

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