OKADA Tatsuya

写真a

Title

Assistant Professor

Researcher Number(JSPS Kakenhi)

30570618
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Current Affiliation Organization 【 display / non-display 】

  • Duty   University of the Ryukyus   Faculty of Engineering   School of Engineering_Electronic and Communication Engineering Program   Assistant Professor  

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Academic degree 【 display / non-display 】

  • Hiroshima University -  Doctor of Engineering

  • Hiroshima University -  Master of Engineering

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External Career 【 display / non-display 】

  • 2009.04
    　
    　

    University of the Ryukyus, Faculty of Engineering, Electrical and Electronics Engineering, Electronics and Electronic Materials,  

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Research Interests 【 display / non-display 】

  • Thin Film Semiconductor,Rapid Thermal Annealing

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Research Areas 【 display / non-display 】

  • Nanotechnology/Materials / Thin film/surface and interfacial physical properties

  • Manufacturing Technology (Mechanical Engineering, Electrical and Electronic Engineering, Chemical Engineering) / Electron device and electronic equipment

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Published Papers 【 display / non-display 】

  • Crystallization of SiN Capped InSb Films on Glass by Rapid Thermal Annealing

    O. Shimoda, Y. Sawama, C. J. Koswaththage, T. Noguchi, T. Kajiwara, T. Sadoh, and T. Okada

    The 21st International Meeting on Information Display     396 - 396   2021.08 [ Peer Review Accepted ]

    Type of publication: Research paper (international conference proceedings)

  • Issues and the Improvement to the Crystallization of a-Si Films for LTPS TFTs on Arbitrary Panels

    T. Noguchi, and T. Okada

    The 20th International Meeting on Information Display     120 - 120   2020.08 [ Peer Review Accepted ]

    Type of publication: Research paper (international conference proceedings)

  • Attractive Crystallization of Semiconductor Films

    T. Noguchi, T. Okada, and C. J. Koswaththage

    The 19th International Meeting on Information Display     226 - 226   2019.08 [ Peer Review Accepted ]

    Type of publication: Research paper (international conference proceedings)

  • Effect of 4% H2 Annealing to Poly-Si TFTs on Polyimide

    D. Tokieda, Y. Ishiki, T. Okada, T. Noguchi, and T. Okuyama

    The 19th International Meeting on Information Display     327 - 327   2019.08 [ Peer Review Accepted ]

    Type of publication: Research paper (international conference proceedings)

  • Study of Leakage Current for Poly-Silicon Thin-Film Transistors with Metal-Source/Drain contact by BLDA

    K. Lee, K. Shimai, W. Choi, T. Okada, and T. Noguchi

    The 19th International Meeting on Information Display     342 - 342   2019.08 [ Peer Review Accepted ]

    Type of publication: Research paper (international conference proceedings)

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Presentations 【 display / non-display 】

  • Crystallization of SiN Capped InSb Films on Glass by Rapid Thermal Annealing

    O. Shimoda, Y. Sawama, C. J. Koswaththage, T. Noguchi, T. Kajiwara, T. Sadoh, and T. Okada

    The 21st International Meeting on Information Display (COEX, Seoul, Korea (ON/OFF-LINE Hybrid Event), August 25-27, 2021) p.396 [P5-40].  2021.08  -  2021.08 

  • Issues and the Improvement to the Crystallization of a-Si Films for LTPS TFTs on Arbitrary Panels

    T. Noguchi, and T. Okada

    The 20th International Meeting on Information Display (Online Conference, August 25-28, 2020) p.120 [05_1583].  2020.08  -  2020.08 

  • Study of Leakage Current for Poly-Silicon Thin-Film Transistors with Metal-Source/Drain contact by BLDA

    K. Lee, K. Shimai, W. Choi, T. Okada, and T. Noguchi

    The 19th International Meeting on Information Display (HICO, Gyeongju, Korea, August 27-30, 2019) p.342 [P02-57].  (HICO, Gyeongju, Korea)  2019.08  -  2019.08 

  • Effect of 4% H2 Annealing to Poly-Si TFTs on Polyimide

    D. Tokieda, Y. Ishiki, T. Okada, T. Noguchi, and T. Okuyama

    The 19th International Meeting on Information Display (HICO, Gyeongju, Korea, August 27-30, 2019) p.327 [P02-42].  (HICO, Gyeongju, Korea)  2019.08  -  2019.08 

  • Attractive Crystallization of Semiconductor Films

    T. Noguchi, T. Okada, and C. J. Koswaththage

    The 19th International Meeting on Information Display (HICO, Gyeongju, Korea, August 27-30, 2019) p.226 [B20-3].  (HICO, Gyeongju, Korea)  2019.08  -  2019.08 

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